New Competence-Center for Nanoimprint in North America

(DGAP-Media / 18.08.2015 / 14:00)

New Competence-Center for Nanoimprint in North America

Garching, August 18, 2015 - SUSS MicroTec, a global supplier of equipment
and process solutions for the semiconductor industry and related markets,
and the Singh Center for Nanotechnology at the University of Pennsylvania
(Penn) are announcing a cooperation agreement in the field of nanoimprint
technologies. As part of this cooperation, Penn has recently received the
equipment set and the technology know-how for Substrate Conformal Imprint
Lithography (SCIL), that will expand the capabilities of the recently
installed MA/BA6 Gen3 Mask Aligner from SUSS MicroTec at Penn.

Substrate Conformal Imprint Lithography (SCIL) is a nanoimprint technique
combining the advantages of both soft and rigid stamps, allowing large-area
patterning and sub-50nm resolution to be achieved at the same time. SCIL is
applied in diverse fields, ranging from HB LEDs, Photovoltaics, MEMS, NEMS
and mass production of optical gratings for gas sensing and
telecommunications.

The Singh Center for Nanotechnology will implement SCIL for use in
plasmonic devices, semiconductor nanowires, flexible nanocrystal
electronics, biodegradable sensors and MEMS batteries. In addition,
Lithography Manager Dr. Gerald Lopez will lead the Center's efforts in
qualifying new nanoimprint materials and related process technology
development in close cooperation with SUSS MicroTec.

As a further important part of the cooperation, SUSS MicroTec's customers
will gain direct access to the cleanroom facilities and the equipment set
installed at Penn, serving as a demonstration center for North American
customers. The experience and high technology level of Penn allows the
customer to see the entire process flow, the imprinting process itself and
the subsequent steps up to a finished device.

"We are pleased to collaborate with SUSS MicroTec for developing
applications with SCIL. By combining our strengths in micro- and
nanofabrication, we are able to provide superior nanoimprint capabilities
to our researchers," stated Professor Mark Allen, Scientific Director of
the Singh Center for Nanotechnology and Alfred Fitler Moore, Professor of
Electrical and Systems Engineering. "This industrial partnership enhances
our ability to demonstrate how nanoimprint technology serves as a catalyst
in research and its translation into the commercial sector."

"We are very happy about the cooperation with the Singh Center for
Nanotechnology. Their work will contribute strongly to further