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SUSS MicroTec Launches LI Series - the New Operator-Assisted Surface Laser Imagers

DGAP-News: SÜSS MicroTec AG / Key word(s): Product Launch
SUSS MicroTec Launches LI Series - the New Operator-Assisted Surface Laser
Imagers

18.05.2016 / 14:00
The issuer is solely responsible for the content of this announcement.

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SUSS MicroTec Launches LI Series - the New Operator-Assisted Surface Laser
Imagers

Garching, May 19, 2016 - SUSS MicroTec, a global supplier of equipment and
process solutions for the semiconductor industry and related markets, has
launched the LI Series - a new Surface Laser Imaging platform as pre-
announced on May 4, 2016.

The highly versatile technology of the LI for laser surface processing
ranges from sub micrometric pattering of resist coated substrates to micro-
ablation, photo-chemistry treatment as well as metrology.

The patterns, defined by a CAD process, are transferred by accurately
moving the targeted substrates underneath a focused and scanning laser
beam. In addition, the Laser Imager configuration is highly customizable,
to best fit the specific requirements of each user. The technology supports
substrate sizes from small pieces up to 300 mm, and it reaches a resolution
down to 0.8 µm. Multi-layer alignment is possible via both top and bottom
side alignment optical systems. Beside the 405 nm GaN laser for standard
thin resist lithography processes, a second laser source can also be added
to additionally address diverse processes such as, among other, thick
resists like SU8, and infrared sensitive materials.

Core advantage of the Laser Imager is its flexibility, making it suitable
for the various requirements of academic and industrial R&D facilities. The
main applications include a wide variety of nano- and 3D structuring for
high resolution wafer lithography, micro-optical components, sensors,
microfluidic devices, and photo mask manufacturing.

"With the Surface Laser Imaging platform, we add a tool to our product
portfolio that expands our existing exposure equipment set towards higher
resolution requirements for leading edge applications." says Dr. Per-Ove
Hansson, CEO of SUSS MicroTec AG. "With this addition, we are enhancing our
leadership position and offering the most comprehensive set of products and
technologies for the lithography R&D market."

About SUSS MicroTec
SUSS MicroTec is a leading supplier of equipment and process solutions for
microstructuring in the semiconductor industry and related markets. In
close cooperation with research institutes and industry partners SUSS
MicroTec contributes to the advancement of next-generation technologies
such as 3D Integration and nanoimprint lithography as well as key processes
for MEMS and LED manufacturing. With a global infrastructure for
applications and service SUSS MicroTec supports more than 8.000 installed
systems worldwide. SUSS MicroTec is headquartered in Garching near Munich,
Germany. For more information, please visit http://www.suss.com




Contact:
SUSS MicroTec AG
Franka Schielke
Schleissheimer Strasse 90
85748 Garching, Deutschland
Tel.: [phone]
Fax: [phone]
Email: [e-mail]


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18.05.2016 Dissemination of a Corporate News, transmitted by DGAP - a
service of EQS Group AG.
The issuer is solely responsible for the content of this announcement.

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Language: English
Company: SÜSS MicroTec AG
Schleissheimer Strasse 90
85748 Garching
Germany
Phone: [phone]
Fax: [phone]
E-mail: [e-mail]
Internet: www.suss.com
ISIN: DE000A1K0235
WKN: A1K023
Indices: TecDAX
Listed: Regulated Market in Frankfurt (Prime Standard); Regulated
Unofficial Market in Berlin, Dusseldorf, Hamburg, Munich,
Stuttgart


End of News DGAP News Service
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464625 18.05.2016