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Obducat has received a first NIL patent granted in China. The patent encompasses an element within the nano imprint lithography (NIL) process called multi layered resist coating. The patent focuses on so-called multi layered resist coating, facilitating a production process that enables a higher tolerance level for small structure production. The process can be used for production of stampers as well as for imprints, thus enabling a higher cost efficiency which further strengthens the overall competitive advantage NIL offers in comparison with alternative techniques. Patrik Lundstöm, CEO Obducat, comments: “This is yet another important milestone for Obducat. A little more than a month ago, we received a NIL patent in the US and the fact that we now have received a crucial patent approved in China is very positive. The Chinese market will be very important for NIL and consequently also for Obducat. As previously announced, Obducat delivered two NIL systems to two Chinese universities during 2004. This patent will strengthen our position in Chine further.” |
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| aus der Diskussion: | OBDUCAT.......QUO VADIS ??? |
| Autor (Datum des Eintrages): | Charly_2 (27.09.05 12:46:56) |
| Beitrag: | 86 von 25,184 (ID:18043673) |
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