|
"Licht und Schatten" in der Lithographie zur EUV -Technik gehören die Photoresistenten offenbar dazu http://english.etnews.com/20200110200003 Zitat .......EUV photoresist especially is used for next-generation semiconductor manufacturing process because EUV is emerging as a potential light source for 7nm microfabrication process .... Samsung Electronics especially is devoting its heart and soul into introducing a foundry business for EUV process as part of its strategy to become the best system semiconductor company in the world... |
|
| aus der Diskussion: | ASML Holding N.V. |
| Autor (Datum des Eintrages): | bezzz (11.01.20 10:03:15) |
| Beitrag: | 22 von 494 (ID:62344694) |
| Alle Angaben ohne Gewähr © wallstreetONLINE | |