Onto Innovation Expands Portfolio of Process Control Solutions for High Growth Specialty Markets

Onto Innovation Inc. (NYSE: ONTO) today announced the introduction of the Atlas S optical critical dimension metrology system and the Element S high-speed impurity mapping, dielectric film composition and epi thickness measurement system. The two new systems complement existing Dragonfly inspection, IVS overlay, and Echo metrology product families building on the company’s strategy to provide a portfolio of comprehensive process control tools and software that work together to solve a wide range of inherent process challenges in the specialty markets. Within the specialty markets, growth of power applications, based on Si, SiC and GaN device technologies, is fueled by the transition to electric vehicles and the rapid adoption of GaN into fast charge applications in both consumer and automotive markets. Specifically, the demand for SiC and GaN power devices is seeing an annual average growth rate approaching 34% and 44% respectively, through 2027, according to Yole Group. Customer enthusiasm around both Atlas S and Element S systems has resulted in over $26 million in bookings with customers taking delivery of initial systems in the fourth quarter of 2023. These new systems, along with the entire Onto specialty portfolio, contribute to a 24% increase in year over year revenue for Onto in the power device market.

The Atlas family of products, including the 2022 Best of West winner Atlas V system, has been previously adopted by top DRAM, NAND and logic manufacturers for both optical critical dimension (OCD) metrology and planar films applications. The breadth of capabilities and productivity of the Atlas S system are well suited to a broad range of specialty applications. “With the complexity of automotive power and specialty devices increasing and the ongoing wafer size migration, metrology requirements are getting tighter. Equipped with the latest-generation compute and model guided-machine learning abilities, the Atlas S system enables OCD metrology leveraging Mueller matrix-based analysis and Onto Innovation’s Ai Diffract modelling engine, making it a powerful and flexible optical metrology tool capable of addressing current and future market needs,” says Aditya Vyas, vice president of business development for Onto Innovation.