Merck KGaA, Darmstadt, Germany's New Barrier Materials Offer Superior Flexibility, Reliability, and Longer Lifetime in OLED Devices

New silicon dielectrics processed via low-temperature Plasma Enhanced - Atomic Layer Deposition (ALD) technology enables flexible OLEDs in superior display devices. Provides highly improved barrier characteristics: 100 times more effective and 20 times thinner than existing solutions. Wins Display Component of the Year 2023 Award from Society for Information Display (SID).

TEMPE, AZ / ACCESSWIRE / May 30, 2023 / EMD Electronics, the U.S. and Canada Electronics business of Merck KGaA, Darmstadt, Germany, introduced new barrier materials that offer superior flexibility, higher reliability, and longer lifetime in flexible OLED (organic light-emitting diode) devices compared to existing solutions. Last week, the innovative ALD material won the Display Component of The Year 2023 award from SID, the world's biggest display society.

Foto: Accesswire

Merck KGaA, Darmstadt, Germany Wins Display Component of The Year 2023 award from SID
Damien Tuleu, Executive Vice President and Head of Display Solutions business unit at the Electronics business sector of Merck KGaA, Darmstadt, Germany posing with SID Display Component of The Year 2023 award and SID leader.

Free-form devices with fully flexible OLED displays are one of the fastest-growing trends in data-driven electronics. Compared with standard displays, these foldable, rollable, stretchable devices require a reduction of about 60% of the display module's thickness. However, OLEDs are highly susceptible to degradation by moisture and oxygen. To prevent damage, an encapsulation or barrier is needed that is conformable, flexible yet durable.

"As a pioneer in display materials, we are committed to providing our customers with solutions that enable new form factors," said Damien Tuleu, Executive Vice President and Head of Display Solutions business unit at the Electronics business sector of Merck KGaA, Darmstadt, Germany. "As the most advanced thin-film deposition technology, our low-temperature ALD silicon materials offer highly improved barrier characteristics - 100 times more effective than current solutions. And they come along with a thinner layer too - 20 times thinner than existing solutions. Ultimately, this means better conformability, flexibility, and durability than ever before."

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