EQS-News

ams-OSRAM AG: ams OSRAM and AIXTRON announce qualification of AIXTRON G5+ C and G10-AsP systems on 200mm wafers for Micro LED application - Seite 2

Micro LED technology offers very significant advantages for display technology such as higher pixel density, longer lifetime, higher brightness, faster switching speed and a wider color spectrum. An important benefit is also the low relative energy consumption, which makes Micro LED technology ideal for upcoming generations of smaller display-equipped consumer devices which provide a very limited space for batteries.

The production of Micro LEDs comes with special requirements: volume production includes a special transfer process where multiple thousands of LED chips (arrays) with dimensions measured in micrometers are picked up and transferred. Any defect can result in dead pixels that can make an entire array useless. Hence, an almost error-free epitaxy process is necessary, minimizing defects and allowing for high yield and economically viable production of Micro LEDs.

AIXTRON’s new G10-AsP epitaxy tool has been designed to address the specific needs of this application: It is the world's first fully automated AsP reactor offering fully automated cassette-to-cassette wafer loading as well as a cleaning mechanism based on in-situ etching. Together, these two features have a major impact on the yield performance. In addition, the AIXTRON system offers the advantages of batch reactor technology: it comes with the lowest production cost per wafer currently available in the market and the highest throughput per cleanroom area. At the same time, the new tool comes with precise flow and temperature control permitting the best material uniformities run after run.

 

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